Artificial Neural Networks to Predict Sheet Resistance of Indium-Doped Zinc Oxide Thin Films Deposited via Plasma Deposition

We implemented deep learning models to examine the accuracy of predicting a single feature (sheet resistance) of thin films of indium-doped zinc oxide deposited via plasma sputter deposition by feeding the spectral data of the plasma to the deep learning models. We carried out114 depositions to create a large enough dataset for use in training various artificial neural network models. We demonstrated that artificial neural networks could be implemented as a model that could predict the sheet resistance of the thin films as they were deposited, taking in only the spectral emission of the plasma as an input with the objective of taking a step toward digital manufacturing in this area of material engineering.