Enhanced electrical properties of antimony doped tin oxide thin films deposited: Via aerosol assisted chemical vapour deposition

S.D. Ponja, B.A.D. Williamson, S. Sathasivam, D.O. Scanlon, I.P. Parkin, C.J. Carmalt

Research output: Contribution to journalArticlepeer-review

121 Citations (Scopus)

Abstract

Transparent conducting oxides have widespread application in modern society but there is a need to move away from the current ‘industry champion’ tin doped indium oxide (In2O3:Sn) due to high costs. Antimony doped tin(IV) oxide (ATO) is an excellent candidate but is limited by its opto-electrical properties. Here, we present a novel and scalable synthetic route to ATO thin films that shows excellent electrical properties. Resistivity measurements showed that at 4 at% doping the lowest value of 4.7 × 10−4 Ω cm was achieved primarily due to a high charge carrier density of 1.2 × 1021 cm−3. Further doping induced an increase in resistivity due to a decrease in both the carrier density and mobility. Ab initio hybrid density functional theory (DFT) calculations show the thermodynamic basis for the tail off of performance beyond a certain doping level, and the appearance of Sb(III) within the doped thin films.
Original languageEnglish
Pages (from-to)7257-7266
JournalJournal of Materials Chemistry C
Volume6
Issue number27
DOIs
Publication statusPublished - 19 Jun 2018

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