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Formation of intrinsic point defects in AlN: a study of donor and acceptor characteristics using hybrid QM/MM techniques

  • Lei Zhu
  • , Xingfan Zhang
  • , Qing Hou
  • , You Lu
  • , Thomas W. Keal
  • , John Buckeridge
  • , C. Richard A. Catlow
  • , Alexey A. Sokol
  • Department of Materials, University of Oxford, Parks Road
  • University College London, Department of Chemistry, Materials Chemistry Centre
  • Institute of Photonic Chips, University of Shanghai for Science and Technology
  • STFC Scientific Computing, Daresbury Laboratory, Warrington
  • School of Engineering, London South Bank University
  • School of Chemistry, Cardiff University

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)
8 Downloads (Pure)

Abstract

The wide-gap material aluminium nitride (AlN) is gaining increasing attention for its applications in optoelectronics, energy, and quantum computing, making the investigation of its defect properties crucial for effective use in these fields. This study employs a hybrid quantum mechanical/molecular mechanical (QM/MM) embedded cluster method and uses three different hybrid-level density functional theory (DFT) functionals (B97-2, PBE0, and BB1K) to investigate systematically the thermodynamic stability, electronic properties, and donor/acceptor nature of intrinsic charged point defects in AlN. Our approach allows for the examination of defects within a significantly larger simulation cell, enhancing the reliability of the calculations. Our findings highlight the stable structures of defects including the symmetry-breaking reconstruction of octahedral-centred nitrogen interstitial and nitrogen split-interstitial defects, as well as the potential of nitrogen vacancies and aluminium interstitial defects as sources of shallow donor species. Additionally, we compute equilibrium defect concentrations at different annealing temperatures up to 2800 K, elucidating the roles of nitrogen and aluminium vacancies and interstitials in the conductivity of undoped, n-type doped, and p-type doped AlN. This comprehensive study advances the understanding of defect stability and electronic properties in AlN, paving the way for its enhanced application in advanced technologies.

Original languageEnglish
Pages (from-to)25449-25464
Number of pages16
JournalJournal of Materials Chemistry A
Volume12
Issue number37
DOIs
Publication statusPublished - 8 Aug 2024

Bibliographical note

Publisher Copyright:
© 2024 The Royal Society of Chemistry.

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

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