Highly Conductive Zinc Oxide Based Transparent Conductive Oxide Films Prepared using RF Plasma Sputtering Under Reducing Atmosphere

Keyphrases

• Hydrogen Gas 100%
• Transparent Conducting Oxide 100%
• Argon 100%
• Deposition Process 100%
• Zinc Oxide 100%
• Highly Conductive 100%
• Plasma Sputtering 100%
• Color Function 100%
• Argon-hydrogen 100%
• Oxide-based 100%
• Radio Frequency Plasma 100%
• Reducing Atmosphere 100%
• Continuous Improvement 50%
• Monitoring Method 50%
• Time Monitoring 50%
• Radio Frequency 50%
• Indium 50%
• Frequency-based Approach 50%
• Electrical Conductivity 50%
• Plasma Sources 50%
• Zinc Oxide Thin Films 50%
• Spectral Properties 50%
• Emission Spectrum 50%
• Sputter Deposition 50%
• Sputtering Plasma 50%
• Complex Pathways 50%
• Spectral Transmittance 50%
• Thin Film Properties 50%
• Charge Density 50%
• Spectral Colour 50%
• Deposited Film 50%
• Indium Addition 50%
• Zinc-doped Indium Oxide 50%
• IZO Thin Film 50%

Engineering

• Thin Films 100%
• Radio Frequency 100%
• Conductive 100%
• Oxide Film 100%
• Hydrogen Gas 66%
• Deposition Process 66%
• Charge Density 33%
• Deposited Film 33%
• Plasma Source 33%
• Emission Spectra 33%
• Electrical Conductivity 33%

Material Science

• Thin Films 100%
• Indium 100%
• Zinc Oxide 100%
• Oxide Film 100%
• Film 33%
• Oxide Compound 33%
• Density 33%
• Electrical Conductivity 33%
• Sputter Deposition 33%