Single Step Solution Processed GaAs Thin Films from GaMe3 and tBuAsH2 under Ambient Pressure

Sanjayan Sathasivam, Ranga R. Arnepalli, Davinder S. Bhachu, Yao Lu, John Buckeridge, David O. Scanlon, Bhaskar Kumar, Kaushal K. Singh, Robert J. Visser, Christopher S. Blackman, Claire J. Carmalt

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

This article reports on the possibility of low-cost GaAs formed under ambient pressure via a single step solution processed route from only readily available precursors, tBuAsH2 and GaMe3. The thin films of GaAs on glass substrates were found to have good crystallinity with crystallites as large as 150 nm and low contamination with experimental results matching well with theoretical density of states calculations. These results open up a route to efficient and cost-effective scale up of GaAs thin films with high material properties for widespread industrial use. Confirmation of film quality was determined using XRD, Raman, EDX mapping, SEM, HRTEM, XPS, and SIMS.
Original languageEnglish
Pages (from-to)7013-7019
Number of pages7
JournalThe Journal of Physical Chemistry C
Volume120
Issue number13
DOIs
Publication statusPublished - 7 Apr 2016
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2016 American Chemical Society.

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