Vibrational signature of the SiN defect in Si-doped GaNxAs 1-x

J. Buckeridge, S. O'Halloran, S. Fahy

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Abstract

Using first principles density functional theory in a supercell approach, we calculate the full spectrum of localized vibration modes associated with the SiN defect complex in GaAs. Two recently proposed structures are investigated in detail: (a) substitutional Si on a Ga site with substitutional N on an adjacent As site [ (SiGaNAs)q, where q is the charge state of the defect complex], and (b) Si and N atoms forming a split-interstitial defect on an As site [ (SiN)qAs]. All the localized mode frequencies for both defect structures are calculated in the relevant charge states. We have also calculated the formation energy of the (SiGaNAs)q defect as a function of SiN separation, finding that the configuration with the Si on a second-nearest- neighbor Ga site is more favorable in the positive charge state than the configuration with the Si on a nearest-neighbor Ga site to the N atom.

Original languageEnglish
Pages (from-to)1967-1970
Number of pages4
JournalSolid State Communications
Volume150
Issue number41-42
DOIs
Publication statusPublished - Nov 2010
Externally publishedYes

Keywords

  • A. Semiconductors
  • B. Dilute nitrides
  • C. Defects
  • D. Vibrational modes

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